Kudamatsu, Japan

Tsuyoshi Irie

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Toyo Kohan Co., Ltd.. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Tsuyoshi Irie: Innovator in Nickel-Plated Materials

Introduction

Tsuyoshi Irie is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of nickel-plated materials. His innovative approach has led to advancements that enhance the quality and functionality of these materials.

Latest Patents

Irie holds a patent for a "Roughened nickel-plated material and method for manufacturing same." The objective of this invention is to provide a roughened nickel-plated material that minimizes the formation of unevenness, such as grooves, in the nickel-plated layer. The patent describes a roughened nickel-plated material that includes a rolled base material and a roughened nickel-plated layer formed on at least one surface. The surface of the roughened nickel-plated layer has a specified roughness, ensuring high-quality performance.

Career Highlights

Tsuyoshi Irie is associated with Toyo Kohan Co., Ltd., where he has been instrumental in advancing the company's material technologies. His work has not only contributed to the company's reputation but has also set new standards in the industry.

Collaborations

Irie has collaborated with notable colleagues, including Shinichirou Horie and Etsuro Tsutsumi. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Tsuyoshi Irie is a distinguished inventor whose work in nickel-plated materials has made a significant impact in the field. His patent reflects a commitment to quality and innovation, showcasing his expertise and dedication to advancing material science.

Profile summary based on public USPTO records.
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