Miaoli, Taiwan

Tsutomu Shinozaki

This inventor holds 2 USPTO granted patents. Top assignee: Innolux Corporation. Active years: 2020-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsutomu Shinozaki. Retrieved from https://idiyas.com/inventor/tsutomu-shinozaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Tsutomu Shinozaki: Innovator in High-Frequency Device Technology

Introduction

Tsutomu Shinozaki is a notable inventor based in Miaoli, Taiwan. He has made significant contributions to the field of high-frequency devices, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is a high-frequency device and manufacturing method. This method involves providing a substrate and forming a conductive material on it. The process includes standing the substrate and the conductive material for a specified duration, followed by the formation of a conductive layer through repeated steps of forming and standing. The thickness of the conductive layer is maintained within a range from 0.9 μm to 10 μm. This patent highlights the advancements in high-frequency device manufacturing.

Career Highlights

Tsutomu Shinozaki is currently associated with Innolux Corporation, where he continues to push the boundaries of technology in his field. His work has been instrumental in developing efficient manufacturing methods for high-frequency devices.

Collaborations

He has collaborated with notable colleagues such as Ming-Yen Weng and Ker-Yih Kao, contributing to various projects that enhance the capabilities of high-frequency technology.

Conclusion

Tsutomu Shinozaki's innovative work in high-frequency devices exemplifies the impact of dedicated inventors in advancing technology. His patents and collaborations reflect a commitment to excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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