Tokyo, Japan

Tsutomu Nishide


Average Co-Inventor Count = 3.6

ph-index = 7

Forward Citations = 215(Granted Patents)


Location History:

  • Ibaraki, JP (1989 - 2009)
  • Kanagawa, JP (2011)
  • Kamisu, JP (2013)
  • Tokyo, JP (2004 - 2020)

Company Filing History:


Years Active: 1989-2020

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16 patents (USPTO):Explore Patents

Title: Tsutomu Nishide: Innovator in Vanadium Recovery and Imaging Technology

Introduction

Tsutomu Nishide is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of materials recovery and imaging technology. With a total of 16 patents to his name, Nishide's work has had a substantial impact on both industries.

Latest Patents

Nishide's latest patents include a vanadium recovery method and a method for producing electrolytic solutions for redox flow batteries. His vanadium recovery device is designed to efficiently extract vanadium from metal mixtures. The process involves an acid leaching step, a complex generation step, a metal recovery step, and a final vanadium recovery step. Additionally, he has developed a solid-state imaging device that prevents invalid frames by synchronizing shutter and gain settings. This innovation enhances the performance of camera systems.

Career Highlights

Throughout his career, Tsutomu Nishide has worked with notable companies such as Kao Corporation and Sony Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.

Collaborations

Nishide has collaborated with talented individuals in his field, including Takuji Yasukawa and Shin Koike. These partnerships have fostered innovation and the development of advanced technologies.

Conclusion

Tsutomu Nishide's contributions to vanadium recovery and imaging technology exemplify his innovative spirit and dedication to advancing these fields. His patents reflect a commitment to solving complex challenges and improving existing technologies.

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