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For the Inventor, By the Inventor

Yokosuka, Japan

Tsutomu Miyatake

This inventor holds 19 USPTO granted patents and 3 published patent applications and 14 EPO patents, primarily in Position Detection Technology. Top assignees: Sumitomo Heavy Industries, Ltd., Sumitomo Heavy Industries Co., Ltd.. Active years: 1990-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsutomu Miyatake. Retrieved from https://idiyas.com/inventor/tsutomu-miyatake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 84.2

 

Average Co-Inventor Count = 1.1

ph-index = 7

Forward Citations = 219(Granted Patents)


Location History:

  • Ehime, JP (1990)
  • Nihama, JP (1991 - 1992)
  • Kiyose, JP (1993 - 2002)
  • Niihama, JP (2006)
  • Kanagawa, JP (2013)
  • Yokosuka, JP (2015)

Company Filing History:

goldMedal15 out of 1,258 
 
Sumitomo Heavy Industries, Ltd.
 patents
silverMedal4 out of 6 
 
Sumitomo Heavy Industries Co., Ltd.
 patents

Years Active: 1990-2026

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Areas of Expertise:
Coupling Device
Molten Resin Supply
Mold Clamping
Substrate Processing
Wafer Position Detection
Optical System
Chromatic Aberration
Illumination Methods
Exposure Mask
Fresnel Zone Plate
Double-Focus Measurement
Proximity Exposure
19 patents (USPTO):Explore Patents
1. 12741406 - Coupling device and molten resin supply system (2026-09-22),
2. 9200428 - Shovel (2015-12-01),
3. 8435021 - Mold clamping device (2013-05-07),
4. 7060990 - Stage base, substrate processing apparatus, and maintenance method for stage (2006-06-13),
5. 6335791 - Apparatus for detecting positions of wafer and mask and deformation error detecting method (2002-01-01),
6. 6295120 - Position detection technique applied to proximity exposure (2001-09-25),
7. 6285439 - Position detection technique applied to proximity exposure (2001-09-04),
8. 6233043 - Position detection technique applied to proximity exposure (2001-05-15),
9. 6191858 - Position detecting method and apparatus using optical system with oblique optical axes (2001-02-20),
10. 6049373 - Position detection technique applied to proximity exposure (2000-04-11),
11. 6046508 - Position detecting method with observation of position detecting marks (2000-04-04),
12. 5965307 - Position detecting method with observation of position detecting marks (1999-10-12),
13. 5958633 - Exposure mask adapted for position detecting with oblique incident light (1999-09-28),
14. 5827629 - Position detecting method with observation of position detecting marks (1998-10-27),
15. 5218193 - Double-focus measurement apparatus utilizing chromatic aberration by (1993-06-08),

Title: Tsutomu Miyatake: Pioneering Inventor from Yokosuka

Introduction: Tsutomu Miyatake is a renowned inventor hailing from Yokosuka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tsutomu Miyatake holds several patents in various technological domains, including robotics, artificial intelligence, and renewable energy solutions.

Career Highlights: With a career spanning over three decades, Miyatake has been instrumental in developing cutting-edge technologies that have revolutionized industries worldwide. His innovative spirit and dedication to pushing the boundaries of what is possible have earned him a reputation as a visionary in the field of invention.

Collaborations: Throughout his career, Tsutomu Miyatake has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has led to the successful implementation of numerous groundbreaking projects.

Conclusion: Tsutomu Miyatake's relentless pursuit of innovation and his passion for creating technologies that make a difference have solidified his position as a trailblazer in the world of invention. His work continues to inspire future generations of inventors to push the limits of what is possible and create a better world through innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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