Himeji, Japan

Tsutomu Kiyosawa

This inventor holds 1 USPTO granted patent. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsutomu Kiyosawa. Retrieved from https://idiyas.com/inventor/tsutomu-kiyosawa-u7jgg1ws

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tsutomu Kiyosawa: Inventor in Vapor-Phase Film Formation

Introduction

Tsutomu Kiyosawa is an inventor associated with Himeji, Japan. His patent work concerns semiconductor manufacturing, particularly vapor-phase growth equipment and methods for forming films on wafers. He is associated with Kabushiki Kaisha Toshiba and Toshiba Electronic Devices & Storage Corporation.

Latest Patents

The supplied information identifies one patent for Kiyosawa: “Vapor Phase Growth Apparatus and Film Formation Method.” The invention describes an apparatus with a susceptor that supports a wafer and a ring-shaped wafer guide surrounding it. The susceptor includes a wafer support portion, a guide support portion, and an inward portion positioned radially inward from the wafer support portion. The inward portion’s upper surface is below the wafer contact surface, while the wafer contact surface is above the guide contact surface.

During film formation, a control unit uses two temperature sensors to measure different regions of the wafer. The first sensor measures a region overlapping the wafer support portion, and the second measures a region overlapping the inward portion. This arrangement addresses temperature measurement within the wafer-support structure during processing. The supplied record lists 1 patent for Kiyosawa.

Career Highlights

Kiyosawa’s identified invention focuses on the design of vapor-phase growth equipment and temperature monitoring during wafer film formation. The supplied career information connects him with Kabushiki Kaisha Toshiba and Toshiba Electronic Devices & Storage Corporation.

Collaborations

The available information associates Kiyosawa’s patent work with Kabushiki Kaisha Toshiba and Toshiba Electronic Devices & Storage Corporation. It does not specify additional collaborators or describe the precise roles of these organizations in the patent.

Conclusion

Tsutomu Kiyosawa’s documented patent contribution addresses wafer support and temperature measurement in vapor-phase film formation equipment. His work reflects an engineering focus on semiconductor manufacturing processes and apparatus design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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