The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Feb. 18, 2025
Kabushiki Kaisha Toshiba, Tokyo, JP;
Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;
Tsutomu Kiyosawa, Himeji, JP;
Masaharu Shimabayashi, Ibo, JP;
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION, Tokyo, JP;
Abstract
A vapor phase growth apparatus of an embodiment has a susceptor supporting a wafer, and a ring-shaped wafer guide surrounding the wafer. The susceptor has a wafer support portion supporting the wafer from below, a guide support portion supporting the wafer guide from below, and an inward portion positioned on an inward side in a radial direction from the wafer support portion. An upper surface of the inward portion is positioned below a wafer contact surface of the wafer support portion. The wafer contact surface is positioned above a guide contact surface of the guide support portion. During film formation processing, a control unit measures a temperature of a part in the wafer overlapping the wafer support portion by a first temperature sensor, measures a temperature of a part in the wafer overlapping the inward portion by a second temperature sensor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile