Tsung-Wen Tien

Title: Tsung-Wen Tien: Innovator in Semiconductor Manufacturing

Introduction

Tsung-Wen Tien is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of mask fabrication. His innovative methods have advanced the technology used in the production of integrated circuits.

Latest Patents

Tsung-Wen Tien holds a patent for a "Critical dimension controlled method of plasma descum for conventional quarter micron and smaller dimension binary mask manufacture." This patent outlines a method for forming a mask from a metal layer deposited on a substrate that is transparent to specific radiation wavelengths. The process includes several steps, such as forming a photoresist layer, exposing it to a pattern, and performing isotropic etching of the metal layer. The method emphasizes the use of a dry plasma process for descum operations, which incorporates oxygen and nitrogen gases along with an inert gas.

Career Highlights

Tsung-Wen Tien is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the precision and efficiency of mask manufacturing processes. With a focus on critical dimensions, his innovations have contributed to the advancement of semiconductor technology.

Collaborations

Throughout his career, Tsung-Wen Tien has collaborated with notable colleagues, including Tzy-Ying Lin and Cheng-Lung Duan. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Tsung-Wen Tien's contributions to semiconductor manufacturing through his innovative patent and collaborative efforts highlight his role as a key figure in the industry. His work continues to influence the development of advanced technologies in semiconductor fabrication.