Tsung-Pao Chen

Title: Tsung-Pao Chen: Innovator in Photoresist Technology

Introduction

Tsung-Pao Chen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work focuses on improving the processes involved in integrated circuit manufacturing.

Latest Patents

Chen's latest patents include a photoresist composition designed to reduce photoresist pattern collapse. This innovative composition consists of a first polymer, a second polymer, and a solvent. The first polymer is more soluble than the second polymer in an aqueous solution and exhibits higher etching resistance. Another significant patent involves a method and tool of lithography. This method includes forming a photoresist layer on a substrate, exposing it, rinsing, treating with a chemical modifier, baking, and developing the modified photoresist layer.

Career Highlights

Throughout his career, Tsung-Pao Chen has worked with prominent companies such as Taiwan Semiconductor Manufacturing Company Limited and AU Optronics Corporation. His experience in these leading firms has allowed him to refine his expertise in semiconductor technology and photoresist applications.

Collaborations

Some of his notable coworkers include Sheng-Min Chuang and Teng-Kuei Chuang. Their collaborative efforts have contributed to advancements in the field of lithography and photoresist technology.

Conclusion

Tsung-Pao Chen's innovative work in photoresist technology has made a significant impact on the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes and improving the quality of integrated circuits.