This inventor holds 2 USPTO granted patents. Top assignee: Nano-Architect Research Corporation. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Tsung-Nane Kuo: Innovator in Plasma Processing Technology
Introduction
Tsung-Nane Kuo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and uniformity of plasma treatment processes, which are crucial in semiconductor manufacturing.
Latest Patents
Kuo's latest patents include innovative methods and apparatuses for plasma treating wafers. The first patent describes an induction plasma processing chamber that utilizes a multiturn helical coil to reduce capacitive coupling while maintaining high induction power density and uniformity of reactive species. This invention features a can-like dielectric that promotes plasma species approaching the wafer surface at low pressure, resulting in higher plasma density and etch rates. Additionally, a cap-like dielectric is employed to improve plasma generation uniformity within the chamber.
The second patent outlines a method and reactor for generating high-density uniform plasma. This inductively coupled plasma reactor includes a vacuum chamber with a specially designed dielectric ceiling. The unique coil configuration atop the dielectric ceiling allows for different heights based on its shape, such as planar, dish-shaped, or hat-shaped. This design facilitates effective RF power coupling into the chamber, exciting the plasma and providing a high-density uniform ion plasma for large wafer treatments.
Career Highlights
Tsung-Nane Kuo is associated with Nano-Architect Research Corporation, where he continues to advance plasma processing technologies. His innovative approaches have positioned him as a key figure in the field, contributing to the development of more efficient manufacturing processes.
Collaborations
Kuo has collaborated with notable colleagues, including Fred Yingyi Chen and Hong-Ji Lee. Their combined expertise has further enhanced the research and development efforts within their organization.
Conclusion
Tsung-Nane Kuo's contributions to plasma processing technology through his patents and collaborative efforts have significantly impacted the semiconductor industry. His innovative methods continue to pave the way for advancements in wafer treatment processes.