Tsung-Min Chuo

Title: Tsung-Min Chuo: Innovator in Semiconductor Technology

Introduction

Tsung-Min Chuo is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Tsung-Min Chuo's latest patents is a method of removing an etch mask. This embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to create a patterned target layer. The method further includes performing a first cleaning process on both the patterned etch mask and the patterned target layer, which involves a first solution. Additionally, a second cleaning process is performed to remove the patterned etch mask and expose the patterned target layer, utilizing a second solution. The method also incorporates a third cleaning process on the exposed patterned target layer, followed by a fourth cleaning process that uses the first solution again.

Career Highlights

Tsung-Min Chuo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of manufacturing techniques within the company.

Collaborations

Throughout his career, Tsung-Min Chuo has collaborated with notable colleagues, including Chun-Han Chu and Nai-Chia Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Tsung-Min Chuo is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the field. His contributions continue to shape the future of semiconductor manufacturing processes.