Tainan, Taiwan

Tsung-Lung Huang


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Tsung-Lung Huang

Introduction: Tsung-Lung Huang is a distinguished inventor based in Tainan, Taiwan. Known for his contributions to the semiconductor industry, he holds a significant patent that showcases his innovative approach to improving semiconductor fabrication processes.

Latest Patents: Huang's patent, titled "Semiconductor Structure and Fabricating Method Thereof," presents a novel method for fabricating semiconductor structures. The process includes several key steps: forming a conductive layer on a first insulating layer, etching a portion of the conductive layer to expose a part of the first insulating layer, deforming the surface of the exposed insulating layer to create a rough texture, and ultimately removing any conductive layer residue on the rough surface. This innovative method has the potential to enhance the performance and reliability of semiconductor devices.

Career Highlights: Tsung-Lung Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor manufacturing sector. His role within the company allows him to continually engage in cutting-edge research and development, contributing to advancements in the field. His patent reflects both his technical expertise and his commitment to pushing the boundaries of semiconductor technology.

Collaborations: Throughout his career, Huang has collaborated with various talented individuals, including Wei-Li Huang and Jheng-Jie Wong. These partnerships foster an environment of innovation and support the development of groundbreaking ideas and methodologies within the semiconductor industry.

Conclusion: Tsung-Lung Huang is an exemplary inventor whose work has made a notable impact in the field of semiconductor fabrication. With a unique approach to innovative processes and valuable collaborations, he continues to inspire advancements in technology that could shape the future of the semiconductor industry. His patent serves as a testament to his dedication to innovation and the enhancement of semiconductor structures.

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