Company Filing History:
Years Active: 2023
Title: The Innovations of Tsung Hsien Chang
Introduction
Tsung Hsien Chang is a notable inventor based in Shalu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, which is crucial in semiconductor manufacturing. His innovative approach has led to the development of advanced apparatuses that enhance the efficiency and effectiveness of the polishing process.
Latest Patents
Tsung Hsien Chang holds a patent for a "Chemical mechanical polishing apparatus including a multi-zone platen." This apparatus features a multi-zone platen comprising a plurality of individually controlled concentric toroids. Each toroid's rotation direction, speed, applied force, relative height, and temperature can be controlled independently. This innovation allows for greater precision in the polishing process, which is essential for producing high-quality semiconductor wafers.
Career Highlights
Chang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company has allowed him to apply his inventive skills in a practical setting, contributing to advancements in semiconductor manufacturing technologies.
Collaborations
Some of his notable coworkers include Ting-Hsun Chang and Hung Yen. Their collaboration in the field of semiconductor technology has fostered an environment of innovation and excellence.
Conclusion
Tsung Hsien Chang's contributions to the field of chemical mechanical polishing have made a significant impact on semiconductor manufacturing. His innovative patent showcases his expertise and commitment to advancing technology in this critical industry.