Taipei, Taiwan

Tsung-Hou Lee


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tsung-Hou Lee: Innovator in Memory Cell Technology

Introduction

Tsung-Hou Lee is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of memory cell design. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of memory cell manufacturing processes.

Latest Patents

Tsung-Hou Lee holds a patent for a method titled "Enhance the process window of memory cell line/space dense pattern in sub-wavelength process." This invention provides a new method for creating densely patterned interconnect lines. The first step involves modifying the mask layout to sharply decrease the ratio of line width (L) to line spacing (S). The resulting line pattern reflects this reduction in the L/S ratio. In the second step, the width of the created lines is increased through thermal flow, while the spacing between the lines is concurrently decreased by the same amount. This innovative approach significantly improves the manufacturing process of memory cells.

Career Highlights

Tsung-Hou Lee has had a successful career at Taiwan Semiconductor Manufacturing Company Limited, where he has been instrumental in developing cutting-edge technologies. His work has not only advanced the company's capabilities but has also contributed to the broader semiconductor industry.

Collaborations

Throughout his career, Tsung-Hou Lee has collaborated with notable colleagues, including San-De Tzu and Chih-Hsiung Lee. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Tsung-Hou Lee's contributions to memory cell technology exemplify the spirit of innovation in the semiconductor industry. His patented methods and collaborative efforts continue to influence advancements in this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…