Tsung Han Hsu

Title: Tsung Han Hsu: Innovator in Semiconductor Technology

Introduction

Tsung Han Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for enhancing semiconductor fabrication processes.

Latest Patents

One of Tsung Han Hsu's latest patents is titled "Isolation regions including two layers and method forming same." This method involves etching a semiconductor substrate to create trenches that extend into the substrate. A first dielectric layer is deposited into these trenches, filling the lower portions. An Ultra-Violet (UV) treatment is then performed on this layer using an oxygen-containing process gas. Following this, a second dielectric layer is deposited to fill the upper portions of the trenches. A thermal treatment is conducted on this layer in an additional oxygen-containing process gas. Finally, an anneal is performed on both dielectric layers to complete the process.

Career Highlights

Tsung Han Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

Throughout his career, Tsung Han Hsu has collaborated with notable colleagues, including Kuan-Cheng Wang and Shin-Yeu Tsai. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Tsung Han Hsu is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.