Kurume, Japan

Tsuneo Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Towa Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuneo Tanaka. Retrieved from https://idiyas.com/inventor/tsuneo-tanaka-m55x9xpl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tsuneo Tanaka

Introduction

Tsuneo Tanaka is a notable inventor based in Kurume, Japan. He has made significant contributions to the field of innovation, particularly with his work on practical tools. His dedication to improving everyday items has led to the development of a unique patent.

Latest Patents

Tsuneo Tanaka holds a patent for a working glove, which showcases his ingenuity in creating functional and efficient designs. This invention is aimed at enhancing the usability and comfort of gloves for various tasks.

Career Highlights

Tanaka is associated with Towa Corporation, a company known for its commitment to quality and innovation in the manufacturing sector. His role at Towa Corporation has allowed him to explore and develop new ideas that contribute to the industry.

Collaborations

One of his notable coworkers is Nobuyoshi Koga, with whom he has likely shared insights and expertise in their respective fields. Their collaboration may have fostered an environment of creativity and innovation.

Conclusion

Tsuneo Tanaka's contributions to the field of inventions, particularly with his working glove patent, highlight his commitment to enhancing everyday tools. His work at Towa Corporation and collaboration with colleagues further emphasize the importance of teamwork in driving innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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