Kobe, Japan

Tsuneharu Masuda


Average Co-Inventor Count = 4.1

ph-index = 5

Forward Citations = 53(Granted Patents)


Location History:

  • Kobe, JP (1983 - 1988)
  • Takasago, JP (2001 - 2004)

Company Filing History:


Years Active: 1983-2004

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9 patents (USPTO):Explore Patents

Title: Tsuneharu Masuda: Innovator in Semiconductor Treatment Technology

Introduction

Tsuneharu Masuda is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work focuses on developing advanced devices that enhance the treatment of semiconductor wafers.

Latest Patents

One of Masuda's latest inventions is a high-temperature and high-pressure treatment device. This innovative device is designed to treat semiconductor wafers in an atmosphere of high-temperature and high-pressure gas. It features a pressure vessel with a lower opening for easy access to the wafers, a vertically movable lower lid for opening and closing the opening, wafer transfer means for stacking and unstacking the wafers, and a heater attached to the lower lid for effective heating of the wafers.

Career Highlights

Throughout his career, Masuda has worked with prominent companies, including Kobe Steel, Ltd. His experience in these organizations has allowed him to refine his skills and contribute to the advancement of semiconductor technology.

Collaborations

Masuda has collaborated with notable colleagues such as Yutaka Narukawa and Akira Asari. Their combined expertise has further propelled innovations in the field.

Conclusion

Tsuneharu Masuda's contributions to semiconductor treatment technology are significant and impactful. His inventions continue to influence the industry, showcasing his dedication to innovation and excellence.

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