Tokyo, Japan

Tsukasa Suda

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Steel Corporation. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsukasa Suda. Retrieved from https://idiyas.com/inventor/tsukasa-suda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tsukasa Suda: Innovator in Ultrasonic Technology

Introduction

Tsukasa Suda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ultrasonic technology, particularly in flaw detection methods. His innovative approach has led to the development of a unique patent that enhances the sensitivity of ultrasonic probes.

Latest Patents

Tsukasa Suda holds a patent for a "Flaw detection sensitivity adjustment method and abnormality diagnosis method for ultrasonic probe." This method involves adjusting the flaw detection sensitivity on an array ultrasonic probe by positioning a plate or tubular material opposite the ultrasonic probe. The ultrasonic waves are transmitted from each transducer toward the material, and echoes are received to adjust the sensitivity of each transducer, ensuring equal intensity of the echoes.

Career Highlights

Tsukasa Suda is associated with Nippon Steel Corporation, where he applies his expertise in ultrasonic technology. His work has been instrumental in advancing the capabilities of ultrasonic probes, making them more effective in detecting flaws.

Collaborations

He has collaborated with notable coworkers, including Masaki Yamano and Yoshiyuki Nakao, contributing to various projects that enhance the functionality of ultrasonic technology.

Conclusion

Tsukasa Suda's innovative work in ultrasonic technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions continue to influence the field and improve the accuracy of flaw detection methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…