Suwa, Japan

Tsukasa Muranaka


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 375(Granted Patents)


Company Filing History:


Years Active: 1991-1993

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5 patents (USPTO):Explore Patents

Title: Tsukasa Muranaka: Innovator in Micropump and Switching Regulator Technologies

Introduction

Tsukasa Muranaka is a notable inventor based in Suwa, Japan. He has made significant contributions to the fields of micropump technology and switching regulators. With a total of 5 patents to his name, Muranaka continues to push the boundaries of innovation in his field.

Latest Patents

Muranaka's latest patents include a Switching Regulator Soft Start Circuit and a Micropump Supervisory Control method. The Switching Regulator Soft Start Circuit is designed to eliminate variations in frequency and preselect a suitable operating frequency using a timer. This innovative circuit generates an initial condition release signal after a predetermined interval, allowing for precise control of the switching regulator's output. The Micropump Supervisory Control method and apparatus feature various functions, including safety measures and accurate control of trace discharge rates. This technology adjusts the number and frequency of driving pulses for a piezoelectric valve element, ensuring optimal performance and reliability.

Career Highlights

Muranaka is currently employed at Seiko Epson Corporation, where he applies his expertise in developing advanced technologies. His work has significantly impacted the efficiency and functionality of micropumps and switching regulators.

Collaborations

Muranaka has collaborated with notable colleagues such as Hajime Miyazaki and Masaaki Handa. Their combined efforts have led to innovative solutions and advancements in their respective fields.

Conclusion

Tsukasa Muranaka is a distinguished inventor whose work in micropump and switching regulator technologies has garnered attention and respect in the industry. His innovative patents and contributions continue to shape the future of these technologies.

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