Kyoto, Japan

Tsukasa Hayashi

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 213(Granted Patents)


Company Filing History:


Years Active: 1992-2025

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7 patents (USPTO):

Title: **The Innovative Journey of Tsukasa Hayashi**

Introduction

Tsukasa Hayashi, based in Kyoto, Japan, stands out as a visionary inventor with a remarkable portfolio of five patents. His contributions to the realm of silicon technology have opened new avenues for advancements in various applications, particularly at low temperatures.

Latest Patents

Among his latest inventions is the "Silicon dot forming method and silicon dot forming apparatus." This groundbreaking technology focuses on producing silicon dots with uniform particle diameters and density distributions directly on a substrate, even at lower temperatures. The method involves supplying hydrogen gas, or a combination of hydrogen and silane-containing gas, into a vacuum chamber that can include a silicon sputter target. By applying high-frequency power, plasma is generated to ensure an optimal emission intensity ratio between silicon and hydrogen atoms, resulting in the formation of silicon dots with diameters of 20 nm or lower. Another significant patent is the "Silicon object forming method and apparatus," which facilitates the formation of silicon objects from particles produced through chemical sputtering, merging innovative techniques for high-efficiency silicon production.

Career Highlights

Throughout his career, Tsukasa has garnered experience in reputable companies, including Nissin Electric Co., Ltd. and Emd Corporation. His work has significantly influenced the development of silicon materials, particularly in methods that improve efficiency and effectiveness in the manufacturing process.

Collaborations

Collaboration has been a vital aspect of Tsukasa Hayashi's career. Notable colleagues, such as Koji Miyake and Hajime Kuwahara, have worked alongside him on innovative projects, enhancing the collective expertise within the field of silicon technology.

Conclusion

In conclusion, Tsukasa Hayashi’s innovations, particularly in silicon technology, reflect his dedication to scientific advancement and industry improvement. His patents not only represent significant technical achievements but also contribute essential knowledge to the future of material science and engineering.

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