Tristan Harper

Title: The Innovations of Tristan Harper

Introduction

Tristan Harper is a notable inventor based in Newport, GB. He has made significant contributions to the field of materials science, particularly in the deposition of hydrogenated silicon carbon nitride films. With a total of 2 patents to his name, Harper's work showcases his expertise and innovative spirit.

Latest Patents

Harper's latest patents focus on methods of deposition using plasma enhanced chemical vapor deposition (PECVD). The first patent describes a method for depositing a hydrogenated silicon carbon nitride (SiCN:H) film onto a substrate. This process involves providing the substrate in a chamber, introducing silane (SiH), a hydrocarbon gas or vapor, nitrogen gas (N), and hydrogen gas (H) into the chamber, and sustaining a plasma to deposit SiCN:H at a process temperature of less than about 200° C. The second patent also details a method for depositing SiCN:H, where the substrate is maintained at a temperature of less than about 250° C.

Career Highlights

Throughout his career, Tristan Harper has worked with several companies, including SPTS Technology Limited and SPTS Technologies Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Harper has collaborated with various professionals in his field, including his coworker Kathrine Crook. These partnerships have fostered innovation and the exchange of ideas, further enhancing his contributions to the industry.

Conclusion

Tristan Harper's work in the field of materials science and his innovative patents demonstrate his commitment to advancing technology. His contributions are significant and reflect his expertise as an inventor.