Filton, United Kingdom

Tracey Hawke

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Snap Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tracey Hawke. Retrieved from https://idiyas.com/inventor/tracey-hawke-j6sfisge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tracey Hawke: Innovator in Surface Relief Structures

Introduction

Tracey Hawke is a notable inventor based in Filton, GB. She has made significant contributions to the field of surface relief structures, showcasing her innovative spirit and technical expertise. With a focus on enhancing manufacturing processes, her work has implications across various industries.

Latest Patents

Tracey holds 1 patent for her invention titled "Manufacture of Surface Relief Structures." This patent describes a method and apparatus for etching variable depth features in a substrate. The innovative approach involves the movement of the substrate relative to an etchant during the etching process. This technique allows for a varying etch time, resulting in different depths across the substrate without the need for a varying mask.

Career Highlights

Tracey is currently employed at Snap Inc., where she continues to push the boundaries of technology and innovation. Her work at the company reflects her commitment to advancing manufacturing techniques and improving product quality.

Collaborations

Tracey collaborates with talented individuals such as Ian Sturland and Mark Venables, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Tracey Hawke's contributions to the field of surface relief structures exemplify her role as a pioneering inventor. Her innovative methods and dedication to her craft continue to inspire advancements in manufacturing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…