The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2024
Filed:
Aug. 20, 2020
Applicant:
Snap Inc., Santa Monica, CA (US);
Inventors:
Ian Sturland, Filton Bristol, GB;
Mark Venables, Filton Bristol, GB;
Tracey Hawke, Filton Bristol, GB;
Rory Mills, Rochester Kent, GB;
Ian Macken, Rochester Kent, GB;
Assignee:
Snap Inc., Santa Monica, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B05C 3/02 (2006.01); B05D 1/18 (2006.01); B81C 1/00 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/001 (2013.01); B05C 3/02 (2013.01); B05D 1/18 (2013.01); B81C 1/00523 (2013.01); B81C 1/00539 (2013.01); B81C 1/00555 (2013.01); B81C 1/00626 (2013.01); B81C 1/00634 (2013.01); G02B 5/1857 (2013.01);
Abstract
A method and apparatus for the etching of variable depth features in a substrate is described. Movement of the substrate relative to an etchant (e.g. into or out of the etchant) during the etching process is utilised to provide a varying etch time, and hence depth, across the substrate, and in various examples this is enabled without requiring a varying mask.