Rochester Kent, United Kingdom

Rory Mills

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Snap Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rory Mills. Retrieved from https://idiyas.com/inventor/rory-mills

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Rory Mills

Introduction

Rory Mills is a notable inventor based in Rochester, Kent, GB. She has made significant contributions to the field of surface relief structures through her innovative patent. Her work exemplifies the intersection of creativity and technology, showcasing her dedication to advancing manufacturing processes.

Latest Patents

Rory Mills holds a patent for the "Manufacture of surface relief structures." This patent describes a method and apparatus for etching variable depth features in a substrate. The process involves the movement of the substrate relative to an etchant, allowing for a varying etch time and depth across the substrate. Notably, this method can be executed without requiring a varying mask, highlighting its efficiency and versatility.

Career Highlights

Rory is currently employed at Snap Inc., where she continues to innovate and develop new technologies. Her role at the company allows her to collaborate with other talented professionals in the field.

Collaborations

Some of her coworkers include Ian Sturland and Mark Venables, who contribute to a dynamic and creative work environment.

Conclusion

Rory Mills is a pioneering inventor whose work in surface relief structures has the potential to transform manufacturing processes. Her innovative spirit and collaboration with talented colleagues at Snap Inc. continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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