Toshiyuki Ueda

Title: The Innovations of Toshiyuki Ueda

Introduction

Toshiyuki Ueda is a notable inventor based in Nara-city, Nara, Japan. He has made significant contributions to the field of electronics, particularly in the development of thin film capacitors. With a total of 2 patents to his name, Ueda's work showcases his expertise and innovative spirit.

Latest Patents

Ueda's latest patents focus on thin film capacitors on gallium arsenide substrates. One of his patents describes a process where a silicon nitride barrier layer is deposited on a gallium arsenide substrate to prevent evaporation during subsequent heating steps. A silicon dioxide stress reduction layer is then applied on top of the barrier layer. Following this, a first electrode is formed on the stress reduction layer, and a liquid precursor is spun on the first electrode. This precursor is dried at approximately 400°C and annealed at temperatures between 600°C and 850°C to create a BST capacitor dielectric. Finally, a second electrode is deposited on the dielectric and also annealed.

Career Highlights

Throughout his career, Ueda has worked with prominent companies such as Symetrix Corporation and Matsushita Electronics Corporation. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his skills in electronics and materials science.

Collaborations

Ueda has collaborated with several talented individuals in his field, including Masamichi Azuma and Carlos Alberto Paz De Araujo. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Toshiyuki Ueda's contributions to the field of electronics, particularly through his patents on thin film capacitors, highlight his innovative capabilities and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.