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For the Inventor, By the Inventor

Haibara-gun, Japan

Toshiyuki Saie

This inventor holds 7 USPTO granted patents and 1 EPO patent. Top assignee: Fujifilm Corporation. Active years: 2012-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiyuki Saie. Retrieved from https://idiyas.com/inventor/toshiyuki-saie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 42.9

 

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Shizuoka-ken, JP (2012)
  • Haibara-gun, JP (2013 - 2014)
  • Shizuoka, JP (2014 - 2023)

Company Filing History:

goldMedal7 out of 16,949 
 
Fujifilm Corporation
 patents

Years Active: 2012-2023

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7 patents (USPTO):Explore Patents
1. 11848249 - Manufacturing method for thermal conductive layer, manufacturing method for laminate, and manufacturing method for semiconductor device (2023-12-19),
2. 9354514 - Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same (2016-05-31),
3. 8753801 - Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same (2014-06-17),
4. 8715524 - Polishing liquid (2014-05-06),
5. 8409467 - Polishing liquid for semiconductor integrated circuit (2013-04-02),
6. 8404146 - Polishing liquid and polishing method (2013-03-26),
7. 8202445 - Metal polishing composition and chemical mechanical polishing method (2012-06-19),

Title: The Innovations of Toshiyuki Saie

Introduction

Toshiyuki Saie is a prominent inventor based in Haibara-gun, Japan. He has made significant contributions to the field of manufacturing methods, particularly in the development of thermal conductive layers and semiconductor devices. With a total of 7 patents to his name, Saie's work has had a considerable impact on technology and materials science.

Latest Patents

Among his latest patents, Saie has developed a manufacturing method for a thermal conductive layer. This method allows for the creation of a thermal conductive layer with a thermal diffusivity of 3.0×10 ms or more. The process involves using a specific composition that includes a resin, a filler, and a solvent, with a solid content concentration of less than 90% by mass. The method includes a discharge step for applying the composition to a support and a solvent amount reduction step to ensure optimal solid content concentration.

Additionally, he has worked on a photosensitive transparent composition for color filters used in solid-state imaging devices. This composition contains a photopolymerization initiator, a polymerizable compound, and an alkali-soluble resin. The cured film produced from this composition exhibits a refractive index of 1.60 to 1.90 for light at a wavelength of 633 nm, showcasing its potential for advanced imaging applications.

Career Highlights

Toshiyuki Saie is currently employed at Fujifilm Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the performance and efficiency of various imaging and semiconductor devices.

Collaborations

Throughout his career, Saie has collaborated with notable colleagues, including Tetsuya Kamimura and Kenji Wada. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Toshiyuki Saie's contributions to the field of manufacturing methods and materials science are noteworthy. His innovative patents and collaborations reflect his dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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