Tokyo, Japan

Toshiyuki Namikawa

This inventor holds 3 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 1990-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiyuki Namikawa. Retrieved from https://idiyas.com/inventor/toshiyuki-namikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 36(Granted Patents)


Location History:

  • Tokyo, JP (1990)
  • Kamagaya, JP (1999)
  • Yokohama, JP (2023)

Company Filing History:


Years Active: 1990-2023

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3 patents (USPTO):Explore Patents

Title: Innovations of Toshiyuki Namikawa

Introduction

Toshiyuki Namikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of imaging and microlithography. With a total of 3 patents, his work has advanced technology in various applications.

Latest Patents

One of his latest patents is an image display device and image display system. This invention involves an ophthalmic imaging system where images captured for each eye are displayed through optical units, allowing observers to visually inspect objects as three-dimensional images. Another notable patent is a proximity-type microlithography apparatus and method. This invention focuses on increasing the illuminance at a mask used in proximity-type microlithography, enhancing throughput and efficiency in the pattern transfer process.

Career Highlights

Toshiyuki Namikawa is associated with Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has positioned him as a key player in the development of advanced imaging technologies.

Collaborations

He has collaborated with notable coworkers such as Ryoichi Sataka and Kinya Kato, contributing to innovative projects and advancements in their respective fields.

Conclusion

Toshiyuki Namikawa's contributions to imaging and microlithography reflect his innovative spirit and dedication to advancing technology. His patents continue to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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