Nikon Corporation

Toshiyuki Namikawa

Takashi Mori

Kinya Kato

Koichi Matsumoto

Kyoichi Suwa

Kazuo Ushida

Masato Shibuya

Masahiro Mizuta

Akira Miyaji

Ryoichi Sataka

Koichi Ohno

Tomohiro Kawasaki

Keiichiro Sakato

In an ophthalmic imaging system an image imaged by an imaging section for a right eye is formed as an imaging image on a display, and then displayed through a right-eye optical unit and a reflection member. An image imaged by an imaging section for a left eye is formed as an imaging image on a display, and then displayed through an optical unit and the reflection member. This thereby enables the object to be visually inspected as a three-dimensional image by the observer viewing the right-eye imaging image and the left-eye imaging image, which differ from each other according to the parallax therebetween, by viewing the respective images through right and left eyes.

Image display device and image display system

Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is illuminated by an illumination optical system. The pattern is transferred to a workpiece separated from the mask by a prescribed standoff. The mask and workpiece can be relatively moved in a scan direction. With respect to the illumination optical system, the workpiece-side numerical aperture in a first direction on the plane of the mask is different from the workpiece-side numerical aperture in a second direction, perpendicular to the first direction, on the plane of the mask. A reflective-type relay optical system can be included that comprises first and second spherical mirrors that do not produce chromatic aberrations.

Proximity-type microlithography apparatus and method

The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.

Projection exposure apparatus

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Tokyo, Japan

Toshiyuki Namikawa