Gunma, Japan

Toshiyuki Kiryu

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kurume University. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiyuki Kiryu. Retrieved from https://idiyas.com/inventor/toshiyuki-kiryu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshiyuki Kiryu

Introduction

Toshiyuki Kiryu is a notable inventor based in Gunma, Japan. He has made significant contributions to the field of electron microscopy through his innovative work. His research focuses on enhancing the performance of embedding resin compositions used in electron microscopy.

Latest Patents

Toshiyuki Kiryu holds a patent for an "Embedding resin composition for electron microscopy and method for observing sample with electron microscope using the same." This invention provides an embedding resin composition that exhibits satisfactory performance as an embedding medium, including embedding performance and sectioning quality. It also demonstrates excellent antistatic performance. The composition comprises an ionic liquid and an embedding medium, which can be an epoxy-based resin, a methacrylate resin, or an unsaturated polyester resin.

Career Highlights

Kiryu is affiliated with Kurume University, where he continues to advance his research in the field of electron microscopy. His work has garnered attention for its practical applications in scientific research and technology.

Collaborations

Toshiyuki Kiryu has collaborated with Keisuke Ohta, contributing to the development of innovative solutions in their field.

Conclusion

Toshiyuki Kiryu's contributions to electron microscopy through his patented innovations highlight the importance of research and development in advancing scientific techniques. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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