Otsu, Japan

Toshiyasu Hibino

USPTO Granted Patents = 4 


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018-2023

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4 patents (USPTO):Explore Patents

Title: Innovator Toshiyasu Hibino: Advancing Photosensitive Resin Technology

Introduction

Toshiyasu Hibino, a pioneering inventor based in Otsu, Japan, has made significant contributions to the field of materials science through his innovative solutions in photosensitive resin compositions. With a total of four patents to his name, his latest works exemplify his dedication to advancing technology in solid-state imaging applications.

Latest Patents

Hibino's most recent patent focuses on a positive photosensitive resin composition which ensures high light transmittance, high heat resistance, and excellent pattern processability. This innovative composition includes polysiloxane, a naphthoquinonediazide compound, and a solvent, effectively enhancing the performance and functionality of imaging devices. Another notable patent involves a resin composition comprising silica particles, a polysiloxane, and an amine compound, showcasing the versatility and ease of application of his compositions in forming even films on varied surfaces, including complex geometries like lenses.

Career Highlights

Toshiyasu Hibino is currently employed by Toray Industries, Inc., a leader in advanced materials. Throughout his career, he has been dedicated to research and development, particularly in creating materials that improve the quality and reliability of imaging technology. His innovative contributions have positioned him as a respected figure in the sector.

Collaborations

In his professional journey, Hibino collaborates with distinguished colleagues such as Mitsuhito Suwa and Ryo Nagase. Together, they foster a creative environment that encourages the development of cutting-edge technologies, pushing the boundaries of what is possible in the field of materials science.

Conclusion

Toshiyasu Hibino stands out as a significant innovator in the realm of photosensitive resins, and his patents continue to shape the future of solid-state imaging. With ongoing collaborations and a commitment to research, his work reflects a forward-thinking approach that promises to influence various applications in technology for years to come.

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