This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignees: Jx Nippon Mining Metals Corporation, Nippon Mining & Metals Co., Ltd.. Active years: 2009-2018.
Company Filing History:
2 out of 481 
1 out of 165 Years Active: 2009-2018
Title: Toshiya Kurihara: Innovator in Sputtering Technology
Introduction
Toshiya Kurihara is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. With a total of 3 patents to his name, Kurihara's work has had a substantial impact on the manufacturing of thin films.
Latest Patents
Kurihara's latest patents include innovative technologies that enhance the performance and reliability of sputtering targets. One of his key inventions is an oxide sintered compact and sputtering target formed from said oxide sintered compact. This invention features an IGZO sintered compact composed of indium (In), gallium (Ga), zinc (Zn), oxygen (O), and unavoidable impurities. The IGZO sintered compact boasts a flexural strength of 50 MPa or more and a bulk resistance of 100 mΩcm or less. This technology aims to suppress target cracks and reduce particle generation during deposition via DC sputtering, ultimately facilitating the formation of high-quality thin films.
Another significant patent is the sputtering target assembly, which comprises two or more sputtering target-backing plate bonded bodies aligned in the width direction. Each bonded body includes a cylindrical target with a diameter of 100 mm or more and a length of 1000 mm or more, composed of three or more target pieces divided in the circumferential direction. This assembly is designed to minimize defects caused by particles originating from the piece-bonding area, enhancing the overall efficiency of the sputtering process.
Career Highlights
Throughout his career, Toshiya Kurihara has worked with prominent companies in the industry, including JX Nippon Mining & Metals Corporation and Nippon Mining & Metals Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and sputtering technology.
Collaborations
Kurihara has collaborated with notable colleagues such as Yohei Yamaguchi and Koji Kakuta. These partnerships have contributed to the advancement of innovative solutions in the field of sputtering technology.
Conclusion
Toshiya Kurihara is a distinguished inventor whose work in sputtering technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence, making him a key