Tokyo, Japan

Toshiya Ishii

This inventor holds 31 USPTO granted patents and 1 published patent application and 3 EPO patents, primarily in Liquid Crystal Displays. Top assignees: Nec Corporation, Nec Lcd Technologies, Ltd., Toppan Printing Co., Ltd.. Active years: 2000-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiya Ishii. Retrieved from https://idiyas.com/inventor/toshiya-ishii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 80.6

 

Average Co-Inventor Count = 2.9

ph-index = 11

Forward Citations = 361(Granted Patents)


Location History:

  • Toyko, JP (2007)
  • Kanagawa, JP (2005 - 2011)
  • Tokyo, JP (2000 - 2022)

Company Filing History:


Years Active: 2000-2022

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Areas of Expertise:
Liquid Crystal Display
Manufacturing Method
Driving Technique
Gas Barrier Laminate
Reflection Display
Ferroelectric Display
Orientation Control
Active-Matrix Display
Multi-Domain Display
Cholesteric Color Filters
Panel Design
Laminate Production
31 patents (USPTO):Explore Patents

Title: Toshiya Ishii - Innovative Inventor from Tokyo

Introduction: Toshiya Ishii is a renowned inventor based in Tokyo, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Toshiya Ishii holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise.

Career Highlights: With over two decades of experience in the industry, Toshiya Ishii has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized the way we approach modern challenges.

Collaborations: Throughout his career, Toshiya Ishii has collaborated with top companies in Japan and internationally, fostering innovation and driving progress in the global tech landscape.

Conclusion: Toshiya Ishii's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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