Hiratsuka, Japan

Toshio Okumura


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1996-1997

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2 patents (USPTO):Explore Patents

Title: Toshio Okumura: Innovator in Harmful Gas Cleaning Technologies

Introduction

Toshio Okumura is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of environmental technology, particularly in the area of cleaning harmful gases. With a total of 2 patents to his name, Okumura's work focuses on innovative processes that enhance safety and efficiency in semiconductor manufacturing.

Latest Patents

Okumura's latest patents include a process for cleaning harmful gas that effectively removes basic gases such as ammonia and amines. This process involves bringing a gas containing these harmful components into contact with a cleaning agent made of cupric salt supported on an inorganic carrier. The method is particularly effective in removing harmful gases from exhaust produced during semiconductor production. Additionally, he has developed another process that targets alkoxide compounds, utilizing an alkali metal compound supported on a metallic oxide composition. This process ensures the safe removal of harmful components in gases exhausted from semiconductor manufacturing processes.

Career Highlights

Throughout his career, Toshio Okumura has been dedicated to advancing technologies that mitigate environmental hazards. His innovative approaches have not only contributed to cleaner production processes but have also enhanced safety measures in the industry. His work is recognized for its practical applications and effectiveness in real-world scenarios.

Collaborations

Okumura has collaborated with esteemed colleagues such as Takashi Shimada and Toshiya Hatakeyama. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Toshio Okumura's contributions to harmful gas cleaning technologies exemplify his commitment to innovation and environmental safety. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and offer effective solutions to address them.

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