The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 1996

Filed:

May. 12, 1994
Applicant:
Inventors:

Takashi Shimada, Hiratsuka, JP;

Toshio Okumura, Hiratsuka, JP;

Toshiya Hatakeyama, Hiratsuka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ; B01D / ;
U.S. Cl.
CPC ...
4232451 ; 423210 ;
Abstract

A process for cleaning a harmful gas which includes contacting a gas containing as a harmful component an alkoxide compound of the formula M(OR).sub.x, wherein M is a metallic element, OR is an alkoxy group and x is the valency of the metal, such as trimethylphosphorous, with a cleaning agent, which is an alkali metal compound such as potassium hydroxide, sodium hydroxide and potassium oxide, supported on a metallic oxide composition comprising cupric oxide and manganese dioxide, wherein the total amount of the cupric oxide and the manganese dioxide is at least 60% by weight based on the total amount of the metallic oxide, to remove the harmful component from the harmful gas. The process effectively and safely removes harmful components in gases exhausted from semiconductor manufacturing processes.


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