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For the Inventor, By the Inventor

Yokohama, Japan

Toshio Negishi

This inventor holds 25 USPTO granted patents and 9 published patent applications, primarily in Liquid Discharge Technology. Top assignee: Canon Kabushiki Kaisha. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshio Negishi. Retrieved from https://idiyas.com/inventor/toshio-negishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 80.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Kawasaki, JP (2012)
  • Yokohama, JP (2012 - 2023)
  • Kanagawa, JP (2023 - 2024)

Company Filing History:

goldMedal25 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2012-2025

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Areas of Expertise:
Element Substrate
Liquid Discharge Head
Printing Apparatus
Recording Apparatus
Semiconductor Device
Inkjet Printhead
Liquid Ejection Head
Manufacturing Method
Print Element Board
Recording Head
Liquid Ejection
Head Unit
25 patents (USPTO):Explore Patents
1. 12499955 - Element substrate (2025-12-16),
2. 12374414 - Semiconductor device, liquid discharge head, and liquid discharge apparatus (2025-07-29),
3. 12263676 - Printing element board and printing apparatus including printing element board (2025-04-01),
4. 12046309 - Element substrate (2024-07-23),
5. 11981129 - Element substrate, liquid discharge head, and printing apparatus (2024-05-14),
6. 11975536 - Element substrate, liquid discharge head, and liquid discharge apparatus (2024-05-07),
7. 11845274 - Recording element substrate, liquid ejection head and recording apparatus (2023-12-19),
8. 11837301 - Substrate, printing apparatus, and manufacturing method (2023-12-05),
9. 11607881 - Element substrate, liquid discharge head, and printing apparatus (2023-03-21),
10. 11247461 - Recording element substrate, liquid ejection head and recording apparatus (2022-02-15),
11. 10894403 - Semiconductor apparatus, liquid discharge head substrate, liquid discharge head, and liquid discharge apparatus (2021-01-19),
12. 10566069 - Semiconductor apparatus, liquid discharge head substrate, liquid discharge head, and liquid discharge apparatus (2020-02-18),
13. 10500851 - Print element substrate, printhead, and printing apparatus (2019-12-10),
14. 10201969 - Recording element substrate, liquid discharge head, and recording apparatus (2019-02-12),
15. 10189249 - Recording element substrate, liquid discharge head, and recording apparatus (2019-01-29),

Title: The Inventor Spotlight: Toshio Negishi's Innovative Patents

Introduction: Toshio Negishi is a prolific inventor based in Yokohama, Japan, with a remarkable portfolio of 19 patents to his name. His groundbreaking work has contributed significantly to the fields of recording technology and printing apparatus.

Latest Patents: Negishi's latest patents include a recording element substrate for a liquid ejection head, featuring advanced components such as antifuse elements, resistors, and switches. Additionally, he has developed a novel substrate design for printing apparatus, incorporating anti-fuse elements and switching elements connected to wiring for efficient voltage application.

Career Highlights: Toshio Negishi is a valued member of the renowned company Canon Kabushiki Kaisha. His expertise and dedication have led to the successful development and implementation of cutting-edge technologies in the company's products.

Collaborations: In his professional journey, Negishi has collaborated closely with talented individuals such as Kazunari Fujii and Takaaki Yamaguchi. Together, they have synergized their skills and knowledge to drive innovation and bring inventive solutions to fruition.

Conclusion: Toshio Negishi's inventive spirit and prowess as an inventor have undeniably left a lasting impact on the realm of technology. His commitment to pushing boundaries and exploring new frontiers continues to inspire and drive progress in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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