Sanbu-gun, Japan

Toshimitsu Uehigashi


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Toshimitsu Uehigashi

Introduction

Toshimitsu Uehigashi is a notable inventor based in Sanbu-gun, Japan. He has made significant contributions to the field of sputtering technology, particularly with his innovative sputtering device. His work has implications for various industries that rely on film deposition processes.

Latest Patents

Uehigashi holds a patent for a sputtering device that efficiently guides sputtering particles ejected from a target to a film deposition subject. This device prolongs the interval at which a stick preventive member requires replacement. The sputtering device features a vacuum chamber where a specified sputtering target is positioned to face a substrate. It deposits a film on the substrate's surface using sputtering particles ejected from the target. Additionally, the device includes particle ejection sections that slope at a specified angle of 30° to 60° with respect to the substrate's surface, arranged in a funnel shape. Magnetic force lines run from an N pole of a magnet at the rear surface of the target to an S pole of a magnet surrounding the target.

Career Highlights

Uehigashi has dedicated his career to advancing sputtering technology. His innovative approach has led to the development of more efficient devices that enhance film deposition processes. He is currently associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to contribute to research and development in this field.

Collaborations

Throughout his career, Uehigashi has collaborated with talented individuals such as Tsuyoshi Sahoda and Yasushi Higuchi. These collaborations have fostered an environment of innovation and have led to the successful development of advanced technologies.

Conclusion

Toshimitsu Uehigashi's contributions to sputtering technology exemplify the impact of innovative thinking in the field of film deposition. His patent for a sputtering device showcases his commitment to enhancing efficiency and effectiveness in this area. Uehigashi's work continues to influence the industry and inspire future innovations.

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