Nihon Shinku Gijutsu Kabushiki Kaisha

Toshimitsu Uehigashi

Tomoyasu Kondo

Yasushi Higuchi

Kuniaki Nakajima

Tsuyoshi Sahoda

A sputtering device that efficiently guides sputtering particles ejected from a target to a film deposition subject and prolongs the interval at which a stick preventive member requires replacement. The sputtering device has a vacuum chamber in which a specified sputtering target is placed so as to face a substrate that is also placed in the vacuum chamber , and deposits a film on a surface of the substrate using sputtering particles ejected from the sputtering target ; and particle ejection sections constructed so as to slope at a specified angle of 30&deg; to 60&deg; with respect to the surface of the substrate , and respectively facing each other in the shape of a funnel are provided on the sputtering target . Lines of magnetic force run from an N pole of a magnet arranged at a rear surface of the target to an S pole of a magnet arranged around the target

Growing community of inventors

Sanbu-gun, Japan

Toshimitsu Uehigashi