Tokyo, Japan

Toshimitsu Sasaki

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022-2023

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Innovations of Toshimitsu Sasaki

Introduction

Toshimitsu Sasaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical surface monitoring devices. With a total of 4 patents to his name, his work focuses on improving polishing methods and apparatuses.

Latest Patents

One of his latest patents is a cleaning method for optical surface monitoring devices. This method is designed to effectively remove abrasive grains that adhere to a light passage in a polishing table. The process involves supplying slurry containing abrasive grains onto a polishing pad while placing a substrate in sliding contact with the pad. During the polishing, light is directed to the substrate, and the reflected light passes through the light passage. After polishing, a chemical liquid is supplied into the light passage to remove any remaining abrasive grains.

Another notable patent is a polishing method and apparatus that reduces the influence of variations in the spectrum of reflected light from substrates, such as wafers. This method includes polishing the substrate against a rotating polishing pad and producing a spectrum of reflected light with each rotation. A three-dimensional data set is created to determine the film thickness of the substrate accurately.

Career Highlights

Toshimitsu Sasaki is currently employed at Ebara Corporation, where he continues to innovate in the field of polishing technologies. His work has been instrumental in enhancing the efficiency and effectiveness of substrate polishing processes.

Collaborations

He collaborates with talented coworkers, including Keita Yagi and Yuki Watanabe, who contribute to the development of advanced polishing techniques.

Conclusion

Toshimitsu Sasaki's contributions to the field of optical surface monitoring and polishing methods highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving processes that are essential in various industries.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…