Annaka, Japan

Toshimasa Okamura


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Toshimasa Okamura

Introduction: Toshimasa Okamura, an inventor based in Annaka, Japan, has made a significant contribution to the field of material science with his innovative patent. With a keen understanding of chemical engineering and advanced materials, Okamura’s work focuses primarily on silicon oxide deposition, which has practical applications in various high-tech industries.

Latest Patents: Okamura holds a patent for a "Silicon Oxide Depositing Source and Coated Film." This invention consists of a mixture of metallic silicon powder and silicon dioxide powder, with both components finely divided to a mean particle size of up to 20 micrometers. The innovative mixture allows for an optimal oxygen to silicon atom ratio between 1.2:1 and 1.7:1. This source can be evaporated using an electron beam heating technique, which notably increases the power of the electron beam without causing splash phenomena. The resulting silicon oxide thin film boasts enhanced transparency and improved barrier properties, making it valuable in various applications.

Career Highlights: Throughout his career, Toshimasa Okamura has been a vital player in companies such as Shin-Etsu Chemical Co., Ltd. and Nihon Shinku Gijutsu Kabushiki Kaisha. His extensive experience in these leading organizations has enriched his expertise in material science and technology, further enhancing his inventive capabilities.

Collaborations: Okamura has had the pleasure of collaborating with talented individuals such as Toshihiko Shindoh and Takeshi Kakegawa. These partnerships have fostered a creative environment that has culminated in groundbreaking developments in his professional sphere.

Conclusion: Toshimasa Okamura is an accomplished inventor whose innovative spirit and commitment to advancement in silicone technology have yielded remarkable results. His patent on silicon oxide deposition not only underscores his technical mastery but also highlights the potential for practical applications in various industries. As technologies evolve, Okamura’s contributions will undoubtedly continue to have a lasting impact in the field.

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