Hachioji, Japan

Toshikazu Yasuye

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikazu Yasuye. Retrieved from https://idiyas.com/inventor/toshikazu-yasuye

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Innovations by Toshikazu Yasuye

Introduction

Toshikazu Yasuye is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of pattern inspection technology. His innovative approach has led to the development of a unique method for detecting defects in patterns.

Latest Patents

Yasuye holds a patent for a "Method and device for inspecting the defect of a pattern represented on." This patent describes a sophisticated technique for inspecting patterns by capturing images from articles with preset patterns. The method involves extracting data from the images while shifting the article relative to a standard position. A parameter indicating the degree of defect is determined based on the extracted data and pre-stored dictionary data. The process includes comparing the extracted parameter with a preset threshold value to assess the pattern's propriety.

Career Highlights

Toshikazu Yasuye is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to focus on advancing inspection technologies that are crucial for various applications in manufacturing and quality control.

Collaborations

Yasuye has collaborated with notable colleagues such as Seiji Kashioka and Yoshihiro Shima. Their combined expertise has contributed to the development of advanced technologies in pattern inspection.

Conclusion

Toshikazu Yasuye's contributions to the field of pattern inspection demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in ensuring quality and precision in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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