The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1982
Filed:
Apr. 10, 1980
Hitachi, Ltd., Tokyo, JP;
Abstract
Herein disclosed is a pattern defect inspecting method which is characterized: in that an image is picked up from an article having a preset pattern thereby to extract the data of the pattern to be inspected while shifting the article with respect to the standard position preset in a picking-up picture image; in that a parameter indicating the defective degree of the pattern to be inspected is determined on the basis of the aforementioned data extracted and the dictionary data stored in advance; in that the parameter indicating the minimum defective degree is extracted from among those determined for such plural patterns to be inspected as are extracted from the vicinity of the standard position; and in that the parameter extracted is compared with a preset threshold value thereby to determine the propriety of the pattern.