Toshikazu Nomura

Title: Toshikazu Nomura: Innovator in Polishing Technology

Introduction

Toshikazu Nomura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency and precision of polishing processes.

Latest Patents

Nomura holds a patent for a polishing-pad laminated structure, polishing-pad positioning instrument, and method of attaching a polishing pad to a polishing table. This invention allows for easy alignment of a through-hole of a polishing pad with a sensor head installed in a polishing table. The polishing-pad laminated structure includes a polishing pad and a release sheet. The polishing pad features a through-hole located at a position corresponding to a sensor head disposed in the polishing table. The release sheet covers an adhesive surface of the polishing pad and is divided into at least a first release sheet and a second release sheet. The first release sheet has a surface area smaller than that of the second release sheet.

Career Highlights

Toshikazu Nomura is associated with Ebara Corporation, a leading company in the field of manufacturing and technology. His work at Ebara has allowed him to develop and refine his innovative ideas, contributing to advancements in polishing technology.

Collaborations

Nomura has collaborated with notable colleagues, including Masaki Kinoshita and Nobuyuki Takahashi. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Toshikazu Nomura's contributions to polishing technology through his patent demonstrate his commitment to innovation and excellence in his field. His work continues to influence the industry and inspire future advancements.