Toshihiro Tojo

Title: The Innovative Contributions of Toshihiro Tojo

Introduction

Toshihiro Tojo is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 2 patents, Tojo's work has advanced the capabilities of inductively-coupled plasma processing apparatuses.

Latest Patents

Tojo's latest patents include an inductively-coupled plasma processing apparatus designed for rectangular substrates. This apparatus features a processing container, a mounting table, and a rectangular metal window that is electrically insulated from the processing container. The antenna unit generates an inductively-coupled plasma inside the processing container. The metal window is divided into regions that are electrically insulated from each other, enhancing the efficiency of the plasma processing. Another patent describes a similar inductively-coupled plasma processing apparatus that generates plasma in a processing chamber, utilizing a high-frequency antenna and a metal window divided into multiple insulated sections.

Career Highlights

Tojo is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to focus on innovative solutions in plasma processing technology.

Collaborations

Tojo has collaborated with notable coworkers such as Kazuo Sasaki and Hitoshi Saito. Their combined expertise has contributed to the development of advanced technologies in their field.

Conclusion

Toshihiro Tojo's contributions to inductively-coupled plasma processing technology demonstrate his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving the efficiency and effectiveness of plasma processing apparatuses.