Toshihiro Ohno

Title: The Innovations of Toshihiro Ohno

Introduction

Toshihiro Ohno is a notable inventor based in Hokkaido, Japan. He has made significant contributions to the field of substrate processing technology. His work has led to advancements that enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Toshihiro Ohno holds a patent for a substrate processing apparatus, substrate processing method, and substrate processing program. This innovative apparatus includes a control part designed to manage substrate processes according to a processing procedure established in a process recipe. The process recipe is intricately linked to multiple partial recipes, which are derived by segmenting the processing procedure into distinct functions. The control part effectively regulates the substrate process based on the procedures outlined in the interconnected partial recipes. He has 1 patent to his name.

Career Highlights

Ohno is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves developing advanced technologies that contribute to the efficiency of substrate processing.

Collaborations

Throughout his career, Toshihiro Ohno has collaborated with esteemed colleagues such as Shoko Endo and Ryu Kitahara. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

Toshihiro Ohno's contributions to substrate processing technology exemplify the impact of innovative thinking in the industry. His patent and work at Tokyo Electron Limited highlight his commitment to advancing technology in this vital area.