Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Toshihiro Kitao
Introduction
Toshihiro Kitao is a notable inventor based in Sapporo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique method for operating plasma tools, which enhances the efficiency and reliability of semiconductor manufacturing processes.
Latest Patents
Kitao holds a patent for the "Autonomous operation of plasma processing tool." This patent describes a method of executing a plasma process on a wafer, where data associated with the process is measured using multiple sensors. The process is terminated at a specific endpoint time, and a post-process fault detection is performed to ensure the wafer state remains within a target range. If a fault is detected, it is corrected using the data collected during the plasma process. This invention showcases his commitment to advancing technology in the semiconductor industry.
Career Highlights
Toshihiro Kitao is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. His work at this esteemed organization has allowed him to apply his innovative ideas and contribute to the development of cutting-edge technologies.
Collaborations
Kitao has collaborated with talented individuals such as Jun Shinagawa and Chungjong Lee. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Toshihiro Kitao's contributions to plasma processing technology exemplify the spirit of innovation in the semiconductor industry. His patent and collaborative efforts highlight the importance of teamwork and creativity in driving technological advancements.