Tokyo Electron Limited

Toshihiro Kitao

Alok Ranjan

Jun Shinagawa

Chungjong Lee

Masaki Kitsunezuka

A method of operating a plasma tool includes executing a plasma process on a wafer. Data associated with the plasma process are measured using a plurality of sensors while the plasma process is executed on the wafer. The plasma process is terminated at an endpoint time. A post-process fault detection is executed by determining whether a post-process wafer state is within a target range. When the post-process wafer state is outside the target range so that a fault is detected, the fault is corrected using the data associated with the plasma process.

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Sapporo, Japan

Toshihiro Kitao