Company Filing History:
Years Active: 2007
Title: Toshihiro Imamura: Innovator in Semiconductor Technology
Introduction
Toshihiro Imamura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to advancements that enhance the performance and reliability of semiconductor devices.
Latest Patents
Imamura holds a patent for a method of fabricating a semiconductor device that features a decreased concentration of phosphorus impurities in polysilicon. This method involves forming a phosphorus-doped polysilicon on a gate oxide film, followed by the deposition of a high-melting metal or a compound of a high-melting metal and silicon. The process ensures that the concentration of phosphorus at the interface between the polysilicon and the gate oxide film is maintained at 2×10(1/cm) or less. Subsequently, thermal oxidation is performed in a wet-hydrogen atmosphere containing water vapor. This innovative approach is crucial for improving the efficiency and effectiveness of semiconductor devices.
Career Highlights
Toshihiro Imamura is currently associated with Elpida Memory, Inc., where he continues to contribute to the advancement of semiconductor technologies. His expertise and innovative mindset have positioned him as a valuable asset in the industry.
Collaborations
Imamura has worked alongside notable colleagues such as Kazuo Ogawa and Kiyonori Ohyu. Their collaborative efforts have furthered research and development in semiconductor technology.
Conclusion
Toshihiro Imamura's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of more efficient semiconductor devices.