Toshihiro Abe

Title: The Innovations of Toshihiro Abe

Introduction

Toshihiro Abe is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of technology, particularly in the areas of resource management and photoengraving processes. With a total of 2 patents, his work reflects a commitment to advancing technological solutions.

Latest Patents

Abe's latest patents include a "Method, apparatus, and computer product for managing operation," which describes a system resource manager that registers a server domain as a group of servers with a uniform physical wire connection. This innovative system allows for the installation of software used by servers within a registered domain, enhancing operational efficiency. Another significant patent is the "Method for forming resist pattern," which presents an improved technique for creating a photoresist pattern during the photoengraving process. This method involves forming a non-photosensitive organic layer over a photoresist layer, allowing for selective exposure to light and improved pattern development.

Career Highlights

Throughout his career, Toshihiro Abe has worked with prominent companies such as Tokyo Shibaura Denki Kabushiki Kaisha and Fujitsu Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in the technology sector.

Collaborations

Abe has collaborated with notable coworkers, including Tiharu Kato and Hatsuo Nakamura. These partnerships have likely fostered a creative environment that has led to the development of his patents and innovations.

Conclusion

Toshihiro Abe's contributions to technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the fields of resource management and photoengraving, showcasing the importance of innovation in advancing technology.