Company Filing History:
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1 out of 2,514 
Years Active: 1989
Title: The Innovations of Toshihiko Shiota
Introduction
Toshihiko Shiota is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of gas absorption technology, particularly in the semiconductor and ceramic manufacturing industries. His innovative approach has led to the development of a unique gas absorber that enhances efficiency in gas treatment processes.
Latest Patents
Shiota holds a patent for a gas absorber designed to efficiently absorb SiF.sub.4 and/or BCl.sub.3 gases emitted from semiconductor fabrication plants and ceramic production facilities. This absorber comprises an alkali agent, water, and a superabsorbent as its effective components. The technology achieves a high reaction rate comparable to traditional wet processes while maintaining the ease of handling associated with dry processes.
Career Highlights
Throughout his career, Toshihiko Shiota has worked with prominent companies such as Ebara Research Co., Ltd. and Ebara Corporation. His experience in these organizations has allowed him to refine his expertise in gas absorption technologies and contribute to advancements in environmental safety and efficiency.
Collaborations
Shiota has collaborated with esteemed colleagues, including Akira Fukunaga and Hidenobu Arimitsu. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Toshihiko Shiota's contributions to gas absorption technology exemplify the impact of innovative thinking in industrial applications. His work continues to influence the semiconductor and ceramic manufacturing sectors, showcasing the importance of effective gas treatment solutions.