Company Filing History:
Years Active: 2023
Title: The Innovations of Toshihiko Ono
Introduction
Toshihiko Ono is a notable inventor based in Corning, NY (US). He has made significant contributions to the field of materials science, particularly in the development of advanced glass and glass-ceramic substrates. His innovative work has led to the creation of a patented technology that enhances semiconductor fabrication processes.
Latest Patents
Toshihiko Ono holds a patent for "Recycled glass and glass-ceramic carrier substrates." This invention involves a glass or glass-ceramic carrier substrate that has undergone at least one complete cycle of a semiconductor fabrication process, followed by a reclamation process. The substrate possesses several key properties, including a coefficient of thermal expansion of less than 13 ppm/° C., a Young's Modulus ranging from 70 GPa to 150 GPa, and an IR transmission greater than 80% at a wavelength of 1064 nm. Additionally, it features a UV transmission of over 20% at wavelengths between 255 nm and 360 nm, along with a thickness tolerance comparable to that of the carrier substrate prior to the semiconductor fabrication process.
Career Highlights
Ono is associated with Corning Incorporated, a leading company in glass and ceramics technology. His work has been instrumental in advancing the capabilities of materials used in semiconductor applications. With a focus on innovation, he has contributed to the development of high-performance substrates that meet the rigorous demands of modern technology.
Collaborations
Throughout his career, Toshihiko Ono has collaborated with esteemed colleagues, including Robert Alan Bellman and Indrajit Dutta. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their collective work.
Conclusion
Toshihiko Ono's contributions to the field of materials science, particularly through his patented innovations, have significantly advanced semiconductor fabrication processes. His work at Corning Incorporated exemplifies the importance of innovation in technology development.