Toshihiko Nakahata

Title: Toshihiko Nakahata: Innovator in Deposition Technology

Introduction

Toshihiko Nakahata is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of deposition technology, particularly through his innovative patent that enhances the step coverage of coating films. His work is recognized for its technical complexity and practical applications in various industries.

Latest Patents

Nakahata holds a patent for a deposition method and deposition apparatus. The objective of this invention is to improve the step coverage of a coating film. The apparatus includes a first electrode, a second electrode, a first power supply source, a second power supply source, and a phase adjuster. The first power supply source features a high-frequency power source and a matching circuit, while the second power supply source also includes a matching circuit that outputs second high-frequency power. This second power is synchronized with the first but operates at a lower frequency. The invention allows for precise control of phase differences, enhancing the efficiency of the deposition process.

Career Highlights

Nakahata is currently employed at Ulvac, Inc., a company known for its advanced vacuum technology and equipment. His role at Ulvac has allowed him to further develop his expertise in deposition methods and contribute to the company's innovative projects.

Collaborations

Throughout his career, Nakahata has collaborated with esteemed colleagues such as Kazuyoshi Hashimoto and Harumasa Yamaguchi. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Toshihiko Nakahata's contributions to deposition technology exemplify the spirit of innovation. His patent not only addresses critical challenges in coating film applications but also reflects his commitment to advancing the field. His work at Ulvac, along with his collaborations, positions him as a key figure in the industry.